Using vacuum magnetron sputtering technology, dual cathode, MF sputtering technology,international advanced control system to coat SiO2/ITO on the float glass.All the process are automatically contron in series.

Important Parts:
    Vacuum chamber：stainless steel ,vertical，cooling water outside the wall,one stainless steel buffle inside the chamber.
    Vacuum system：diffusion pum or turbo pump
    Evaporation source：Dcsputtering target,MF sputtering target on two side of chamber
   workpiece heating：using stainless steel pipe type heater together with Vapor Chamber, so that the heating of the glass can be even.
    Gas Feeding system：MFC和Auto pressure control device.
    Electric control system： touch Screen and PlC auto control， display and operate system technical data by human-machine communicateiong.

    Water cooling system：Vacuum chamber cooling system and cathode cooling, with water presure protection on-off switch and water flow on-off switch。

　　Technical Datra：

Ultimate vacuum pressure:7×1 0^-4 Pa
Average period：1 0 0second／shaft
substrate size: 7 5 0 × 1 2 0 0 (mm)
General Power：3 5 0 kw
DC magnetron target power: 20kw
MF magnetron target power: 20kw